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Friday, October 16, 2020 | History

2 edition of Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing found in the catalog.

Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

International Symposium on Cleaning Technology in Semiconductor Device Manufacturing (3rd 1993 New Orleans, La.)

Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

by International Symposium on Cleaning Technology in Semiconductor Device Manufacturing (3rd 1993 New Orleans, La.)

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Published by Electrochemical Society in Pennington, NJ .
Written in English

    Subjects:
  • Semiconductor wafers -- Cleaning -- Congresses.

  • Edition Notes

    Other titlesCleaning technology in semiconductor device manufacturing.
    Statementedited by Jerzy Ruzyllo, Richard E. Novak ; assistant editors, A. Bowling ... [et al.] ; [sponsored by the] Electronics and Dielectric Science and Technology Divisions.
    SeriesProceedings ;, v. 94-7, Proceedings (Electrochemical Society) ;, v. 94-7.
    ContributionsRużyłło, Jerzy., Novak, Richard E., Electrochemical Society. Electronics Division., Electrochemical Society. Dielectric Science and Technology Division.
    Classifications
    LC ClassificationsTK7871.85 .I5824 1993
    The Physical Object
    Paginationxiii, 604 p. :
    Number of Pages604
    ID Numbers
    Open LibraryOL1441000M
    ISBN 101566770386
    LC Control Number93072867
    OCLC/WorldCa30859113


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Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing by International Symposium on Cleaning Technology in Semiconductor Device Manufacturing (3rd 1993 New Orleans, La.) Download PDF EPUB FB2